plasma ion meaning in Chinese
等离子区离子
Examples
- Plasma ion oscillation
等离子体离子振荡 - Research on deposition diamond - like carbon films with end - hall plasma ion source
端部霍尔等离子体源沉积类金刚石膜的研究 - Some theoretical results and experimental technique in this paper is innovative to the development of rf ion source , moreover , it may be use for reference to the research of other plasma ion sources
同时，本文的研究工作对于其他类型的等离子体离子源(比如小型密封中子发生器离子源)的研究也有重要的参考作用。 - Among of them , radio - frequency ion source is in most wide used for the reasons of its high proton content , long life and reliable performance , etc . h - type radio - frequency ion source is a kind of plasma ion source
其中，高频离子源以其很高的质子比( 70 - 90 ) 、长寿命和可靠的性能而得到了最广泛的应用。高频h型放电离子源属于等离子体离子源。 - In the present work , water plasma ion implantation , instead of the conventional oxygen plasma ion implantation , has been employed to fabricate soi materials . the masses of the three dominant ion species in the water vapor plasma , h2o + , ho + , and o + , are very close to each other , which overcome the problem of co - existence of o and 02 in oxygen plasma source . the oxygen depth profiles in the water plasma ion as - implanted silicon do not disperse much , which makes it possible for the formation of single buried oxide ( box ) layer by choosing appropriate implantation energy and dose
本论文创造性地采用水等离子体离子注入方式代替传统的氧离子注入方式来制备soi结构材料，由于水等离子体中的三种离子h _ 2o ~ + 、 ho ~ +和o ~ +质量数相差很小，克服了氧等离子体中因o _ 2 ~ +和o ~ +质量数相差大而引起的氧在硅中的分布弥散，使注入硅后的氧射程分布相对集中，比较容易退火后形成soi结构材料。